CAS Helu 7783 - 82 -6 Tungsten hexafluoride Mea kūʻai. Nā hiʻohiʻona o Tungsten hexafluoride

ʻO Tungsten hexafluoride (WF₆) he hui kemika me ka helu CAS 7783-82-6. Hoʻohana nui ʻia ia i ka ʻoihana semiconductor a me nā noi ʻenehana kiʻekiʻe ʻē aʻe ma muli o kāna mau waiwai kūikawā. Eia kekahi mau hiʻohiʻona nui o ka tungsten hexafluoride:

Nā waiwai kino:
ʻAno: ʻO Tungsten hexafluoride he kinoea kala ʻole i ka lumi wela a me ke kaomi.
Puni paila: Ma kahi o 12.8°C (55°F).
Lae hehee: -59.2°C (-74.6°F).
Māmā: 6.23 g/cm³ ma 25°C.
Solubility: ʻAʻole hiki ke hana me ka nui o nā mea hoʻoheheʻe maʻamau akā hiki ke hana me ka wai a i ʻole ka makū.
Nā waiwai kemika:
Paʻa: Paʻa ma lalo o nā kūlana maʻamau akā hoʻoheheʻe ʻia ke ʻike ʻia i ka wela a i ʻole ka makū.
Reactivity: He mea hoʻoikaika nui ia me ka wai a me ka hapa nui o nā mea olaola, e hoʻokuʻu ana i nā mea ʻawaʻawa a me ka corrosive hydrogen fluoride (HF).
Nā pōʻino olakino:
ʻona: He ʻawaʻawa loa ka Tungsten hexafluoride ma ka inhalation a hiki ke hoʻoulu i nā pilikia hanu nui, me ka pōʻino o ka māmā.
Corrosivity: He mea ʻino ia i ka ʻili a me nā maka, a hiki i ka ʻike ʻana ke alakaʻi i ke ahi.
Hoʻohana:
ʻOihana Semiconductor: Hoʻohana ʻia ia i nā kaʻina vapor deposition (CVD) no ka waiho ʻana o nā kiʻiʻoniʻoni tungsten i microelectronics.
Metallurgy: Hoʻohana ʻia i ka hana ʻana i nā tungsten-based alloys a me nā pūhui.
Noiʻi: Hoʻohana ʻia ma nā ʻano noiʻi like ʻole ma muli o kāna mau waiwai kūʻokoʻa.
I ka lawelawe ʻana i ka tungsten hexafluoride, e hoʻohana mau i nā lako pale pilikino (PPE) kūpono, e hana ma kahi wahi i hoʻoheheʻe ʻia a i ʻole ka puʻupuʻu fume, a e hahai i nā kuʻina palekana e pale ai i ka inhalation a me ka pili ʻana i ka ʻili. E hōʻoia i hiki iā ʻoe ke komo i nā kaʻina hana ulia pōpilikia a me nā keʻena kōkua mua.