High Purity Silicon Tetrachloride (SiCl4) Specialty Gases
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Purity , % | 99.94 |
Resistivity | ≥ 300 ohm-cm |
Boron | ≤ 0.3 ppba silicon |
Aluminum | ≤ 50 ppbw |
Carbon | ≤ 1.0 ppma |
Iron | ≤ 50 ppbw |
Other Chlorosilane | ≤ 600 ppm |
Technical Information
Cylinder State @ 21.1°C | Liquid |
Flammable Limits In Air | Non-flammable |
Auto Ignition Temperature (°C ) | - |
Molecular Weight (g/mol) | 169.89 |
Specific gravity (air =1) | 5.889 |
Critical Temperature ( °C ) | 233.85 |
Critical Pressure ( psig ) | 529.05 |
description
Silicon Tetrachloride is a corrosive , colorless, nonflammable liquid with a suffocating odor . The vapors are irritating to the mucous membranes and form dense fumes when exposed to humid air . It hydrolyses rapidly in moist air , releasing hydrogen chloride.
Silicon tetrachloride is used as an intermediate in the manufacture of polysilicon, a hyper-pure form of silicon,since it has a boiling point convenient for purification by repeated fractional distillation. The produced polysilicon is used as wafers in large amounts by the photovoltaic industry for conventional solar cells made of crystalline silicon and also by the semiconductor industry.Silicon tetrachloride can also be hydrolysed to fumed silica. High purity silicon tetrachloride is used in the manufacture of optical fibres. This grade should be free of hydrogen containing impurities like trichlorosilane. Optical fibres are made using processes like MCVD and OFD where silicon tetrachloride is oxidized to pure silica in the presence of oxygen.As a feedstock in production of fused silica.
Applications
● In semiconductor fabrication, applications of epitaxial silicon.
● In semiconductor fabrication, plasma etching of metals.
● In organo silicon processes.
● In the manufacturing of fused silica fiber.
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