High Purity Diborane (B2H6) Specialty Gases
Why hesitate ? Inquiry us Now !
Contact usSpecifications
| Purity , % | 99.99 |
| Oxygen | ≤1 ppmv |
| Nitrogen | ≤10 ppmv |
| Carbon Dioxide | ≤5 ppmv |
| Methane | ≤ 1 ppmv |
| Hydrogen | ≤500 ppmv |
| Tetraborane -B4H10 | ≤180 ppmv |
| Pentaborane - B5H11 | ≤10 ppmv |
| Pentaborane - B5H9 | ≤10ppmv |
| Boron Trifluoride | ≤50 ppmv |
Technical Information
| Cylinder State @ 21.1°C | Gas |
| Flammable Limits In Air | 0.8%-98% |
| Auto Ignition Temperature (°C ) | 38 |
| Molecular Weight (g/mol) | 27.67 |
| Critical Temperature ( °C ) | 16.65 |
| Critical Pressure ( psig ) | 587.68 |
Description
Diborane, commonly known as diborane, is the chemical compound with the formula B2H6. It is a toxic, colorless, and pyrophoric gas with a repulsively sweet odor. Given its simple formula, borane is a fundamental boron compound. It has attracted wide attention for its electronic structure. Several of its derivatives are useful reagents.A flammable, toxic, colorless gas used primarily as a p-type dopant for the deposition of epitaxial and amorphous.silicon and as a component in the CVD of BPSG (borate-phosphate-silicate-glass) coatings.
Applications
● In tetrahydrofurane, diborane is a powerfull reducing agent in organic synthesis. *Diborane is largely used in semiconductor manufacturing. Boron atom is an p-type dopant for epitaxial silicon. Boron is introduced in the silicon wafer by diffusion or implantation techniques.
● Diborane is also used for the production of borophosphosilicate glasses (BPS).
description2